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Image credit:  Courtesy National Institute of Standards and Technology
Image credit:  Courtesy National Institute of Standards and Technology
Image credit:  Courtesy National Institute of Standards and Technology
Image credit:  Courtesy National Institute of Standards and Technology
 
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Dennis SwytDennis Swyt
Director, USMS Project
NIST


Talk Title: "Technological Innovation, NIST, and the

U.S. Measurement System"

Abstract
Technological innovation is fundamental to the vitality of the U.S. economy and its industries. The inability to do good measurements can impede technological innovation. This talk will inform you of how NIST is tackling the issue of measurement problems that are barriers to innovation. NIST is doing an assessment of the U.S.’s measurement system based on a survey of industry measurement needs. The assessment uses industry roadmaps, focused workshops, and other fact-finding techniques to identify industry needs so they can be addressed. The talk may also provide you an opportunity to flag issues that you think are important for your industry or firm.

Biographical Sketch
Dr. Dennis A. Swyt is the Director of the USMS Project of the U.S. National Institute of Standards and Technology, appointed by and reporting to the Director of NIST. Immediately prior to that appointment, he was Chief of the NIST Precision Engineering Division, responsible for research and services in the area of dimensional measurement. Prior to that he was Deputy Director of the NIST Manufacturing Engineering Laboratory, the first Chairman of the Source Evaluation Board of the NIST Advanced Technology Program, the Chief of the NIST Program Office, a technical group leader and a researcher. He is a member of the Federal Senior Executive Service and of the American Society of Mechanical Engineering's Board on Standardization and Testing. He holds degrees of BS, MS and PhD in physics and has published extensively in the area of dimensional measurement. He is recipient of a U.S. patent, a Department of Commerce Silver Medal, and a semiconductor industry award for development of the NIST photomask linewidth standard

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