Extreme Ultraviolet Lithography Picture of test structures made with EUV beams at the Advanced Light Source at the Lawrence Berkeley National Lab.
Extreme Ultraviolet Lithography
Picture of test structures made with EUV beams at the Advanced Light Source at the Lawrence Berkeley National Lab.
Source: Naulleau et al., Journal of Vacuum Science and Technology B, Nov/Dec 2002.
Additional information: Associated Physics News Update
Additional information:
Associated Physics News Update
