Number 150 (Story #3), November 5, 1993 by Phillip F. Schewe and Ben Stein ATOM-OPTICS TECHNIQUES FOR MICROCIRCUIT LITHOGRAPHY keep improving. Using the electric fields of laser light as a lens, scientists at NIST (Robert Celotta, 301-975-3710) have been able to steer a beam of chromium atoms onto a silicon substrate with great dexterity; the result is a series of thin ridges 65 nm wide, about 35 nm high, and spaced about 215 nm apart. (Science, 5 Nov.)