Ion implantation
in silicon technology
Ion
implantation is the process of doping or otherwise modifying wafers
of silicon or other semiconductors by generating an ion beam and
steering it into the substrate, so that the ions come
to rest beneath the surface. Without implanters, today's high-performing
integrated circuits would be impossible---Leonard
Rubin and John Poate
Building
success into a high-tech start-up
How
one organizes a start-up company often proves
more important than the product in determining
whether the venture succeeds or fails. "I
would rather have a first-rate management
team with average technology than a first-rate
technology with a second-rate management
team"---John T. Preston
Hybrid semiconductor-molecular
nanoelectronics
These circuits combine a level of advanced complementary metal-oxide
semiconductor devices fabricated by lithographic patterning; a
few layers of parallel nanowire arrays formed, for example, by
nanoimprinting; and a level of molecular devices that would self-assemble
on the nanowires from solution---Konstantin Likharev
Tunable lasers and
fiber-Bragg-grating sensors
Tunable lasers used as the optical source in a fiber-Bragg grating
sensing system can be employed as strain-gage sensors in buildings,
bridges, and airplane bodies; for depth measurements in streams,
rivers, and reservoirs; and for temperature and pressure measurements
in deep oil wells---Mark Wippich and Kathy Li Dessau
