Lithography

Lithography

Interviewed by
David Zierler
Interview date
Location
Video conference
Abstract

Interview with Margaret Murnane, professor of physics at the University of Colorado, Boulder, fellow at JILA, and director of the NSF STROBE Science and Technology Center. Murnane recounts her childhood in Ireland and emphasizes that, culturally, she was encouraged to pursue her interests in science from a young age. She discusses her undergraduate education at University College Cork where she focused on physics and developed her specialties in experimentation with light. Murnane describes the opportunities leading to her graduate work at UC Berkeley, where, for her thesis research, she developed a high-power femtosecond laser to create X-ray emitting plasma. She describes her first faculty appointment at Washington State University in Pullman where she continued work in ultrafast laser science, and she explains the decision to transfer to the University of Michigan at the Center for Ultrafast Optics. Murnane discusses her subsequent decision to join the faculty at JILA, where the instrumentation and opportunities for collaboration in her field were peerless. She describes the centrality of achieving very fast X-ray pulses to her field, and she describes some recent advances in applications such as EUV lithography. Murnane discusses the work that remains to be done to ensure that STEM promotes diversity and inclusivity, and she reflects on the many excellent graduate students she has mentored. At the end of the interview, Murnane conveys her excitement at the possibilities offered in the future of ultrafast lasers, including the ability of real-time microscopes that can make three-dimensional nanoscale and A-scale movies.